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首页> 外文期刊>Microwave Theory and Techniques, IEEE Transactions on >Diagnostics of Plasma Processes Based on Parallelized Spatially Resolved In-Situ Reflection Measurements
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Diagnostics of Plasma Processes Based on Parallelized Spatially Resolved In-Situ Reflection Measurements

机译：基于并行空间分辨原位反射测量的等离子过程诊断

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摘要

A parallelized in-situ plasma measurement setup, consisting of two multipole resonance probes (MRP), a passive signal divider, and two coaxial cables with different lengths is presented in this contribution. The combined reflection coefficient of the applied probes is measured, separated in the time domain, and evaluated. Here, each MRP is able to measure the spatially resolved plasma electron density via its resonance behavior precisely and quasi-simultaneously. Furthermore, the return loss (RL) changes with the collision frequency, which can be detected for each probe. The parallelization and the applied signal processing are confirmed by simulations and combined measurements in CST Schematic as well as by in-situ measurements in an argon plasma. The resulting error is below 1% for the resonance frequency and below 8% for the corresponding RL. Hence, the input power and gas pressure of a plasma process can be controlled effectively.
机译：此文稿介绍了一种并行的原位等离子体测量装置，该装置由两个多极共振探头（MRP），一个无源信号分配器和两个长度不同的同轴电缆组成。测量所施加探针的组合反射系数，在时域中进行分离并进行评估。在这里，每个MRP都可以通过其共振行为精确而准同时地测量空间分辨的等离子体电子密度。此外，回波损耗（RL）随碰撞频率而变化，可以针对每个探针进行检测。并行化和施加的信号处理通过CST示意图中的模拟和组合测量以及在氩气等离子体中的现场测量得到了确认。对于谐振频率，所得误差低于1％，对于相应的RL，所得误差低于8％。因此，可以有效地控制等离子体工艺的输入功率和气压。

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