...
首页> 外文期刊>IEEE transactions on nanotechnology >Negative Capacitance for Boosting Tunnel FET performance
【24h】

Negative Capacitance for Boosting Tunnel FET performance

机译:负电容可提升隧道FET性能

获取原文
获取原文并翻译 | 示例
           

摘要

We have proposed and investigated a super steep subthreshold slope transistor by introducing negative capacitance of a ferroelectric HfO2 gate insulator to a vertical tunnel FET for energy efficient computing. The channel structure and gate insulator are systematically designed to maximize the Ion/Ioff ratio. The simulation study reveals that the electric field at the tunnel junction can be effectively enhanced by potential amplification due to the negative capacitance. The enhanced electric field increases the band-to-band tunneling rate and Ion/Ioff ratio, which results in 10× higher energy efficiency than in tunnel FET.
机译:我们通过将铁电HfO2栅极绝缘体的负电容引入垂直隧道FET来进行能效计算,从而提出并研究了一种超陡峭的亚阈值斜率晶体管。沟道结构和栅极绝缘体经过系统设计,可最大程度地提高Ion / Ioff比。仿真研究表明,由于负电容,电势放大可以有效地增强隧道结处的电场。增强的电场提高了带间隧穿速率和Ion / Ioff比,这导致其能量效率比隧道FET高10倍。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号