首页> 外文期刊>IEEE transactions on nanotechnology >A Comprehensive Computational Modeling Approach for AlGaN/GaN HEMTs
【24h】

A Comprehensive Computational Modeling Approach for AlGaN/GaN HEMTs

机译:AlGaN / GaN HEMT的综合计算建模方法

获取原文
获取原文并翻译 | 示例
           

摘要

This paper for the first time presents a comprehensive computational modeling approach for AlGaN/GaN high electron mobility transistors. Impact of the polarization charge at different material interfaces on the energy band profile as well as parasitic charge across the epitaxial stack is modeled and studied. Furthermore, impact of surface and bulk traps on two-dimensional electron gas, device characteristics, and gate leakage is accounted in this paper. For the first time, surface states modeled as donor type traps were correlated with gate leakage. Moreover, a new approach to accurately model the forward gate leakage in Schottky gate devices is proposed. Finally, impact of lattice and carrier heating is studied, while highlighting the relevance of carrier heating, lattice heating, and bulk traps over the device characteristics. In addition to this, modeling strategy for other critical aspects like parasitic charges, quantum effects, S/D Schottky contacts, and high field effects is presented.
机译:本文首次提出了一种用于AlGaN / GaN高电子迁移率晶体管的综合计算建模方法。建模和研究了不同材料界面上的极化电荷对能带分布以及外延叠层上的寄生电荷的影响。此外,本文还讨论了表面陷阱和体陷阱对二维电子气,器件特性和栅极泄漏的影响。首次将模拟为施主型陷阱的表面状态与栅极泄漏相关联。此外,提出了一种精确建模肖特基栅极器件中正向栅极泄漏的新方法。最后,研究了晶格和载流子加热的影响,同时强调了载流子加热,晶格加热和体阱在器件特性上的相关性。除此之外,还提出了其他关键方面的建模策略,例如寄生电荷,量子效应,S / D肖特基接触和高场效应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号