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Design and characterization of a high-precision resistor ladder test structure

机译:高精度电阻阶梯测试结构的设计与表征

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摘要

A new subsite stepped multiresistor test structure is introduced. This test structure is used for studying and improving small resistance mismatch patterns in resistor ladders for high-resolution analog-to-digital converter applications. By utilizing wafer prober subsite movements and contact pad cross connections in the test structures, in combination with a Kelvin measurement method and dedicated statistical data evaluation technique, this approach enables identification of very small (>0.05%) systematic resistance mismatch patterns in realistic high- precision resistor ladder implementation. The most disturbing mismatch pattern was found to be caused by mechanical stress from the resistor ladder head layout, while others are attributed to decananometer scale reticle writing artefacts.
机译:介绍了一种新的子站点阶梯式多电阻测试结构。该测试结构用于研究和改善高分辨率模数转换器应用中梯形电阻器中的小电阻失配模式。通过利用测试结构中的晶圆探测器子部位移动和接触垫交叉连接,结合开尔文测量方法和专用统计数据评估技术,该方法可以识别出在实际高电阻下非常小(> 0.05%)的系统电阻失配模式。精密电阻梯形图的实现。发现最令人不安的失配模式是由电阻梯形头布局产生的机械应力引起的,而其他原因则归因于癸烷刻度尺标线的书写伪像。

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