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An efficient photoresist development simulator based on cellular automata with experimental verification

机译:基于细胞自动机的高效光刻胶显影模拟器,并进行了实验验证

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摘要

An efficient and practical photoresist development simulator based on cellular automata is presented. Image reversal and chemical amplification processes are also simulated using this simulator. To verify the simulator, a series of experiments have been designed and performed using the Shipley SNR-248 negative resist, a stepper, and a deep ultraviolet source at 248 nm. Experiments were performed for periodic and isolated lines with pitches 300, 400, 500, and 1000 nm, for exposure energy doses of 11, 13, 17, and 23 mJ/cm/sup 2/, and with developer temperatures of 0, 20, and 80/spl deg/C. In all cases, the simulator results were found to be in very good agreement with the corresponding experimental results. The simulator has also successfully reproduced the incomplete opening effect observed in the case of close-spaced parallel lines.
机译:提出了一种基于细胞自动机的高效实用的光刻胶显影模拟器。使用此模拟器还可以模拟图像反转和化学放大过程。为了验证模拟器,已经设计并使用Shipley SNR-248负性抗蚀剂,步进器和248 nm的深紫外光源进行了一系列实验。针对间距为300、400、500和1000 nm,曝光能量为11、13、17和23 mJ / cm / sup 2 /,显影剂温度为0、20,和80 / spl deg / C。在所有情况下,仿真器结果都与相应的实验结果非常吻合。模拟器还成功地再现了在平行行距很近的情况下观察到的不完全打开效果。

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