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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Surface-related phase noise in SAW resonators
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Surface-related phase noise in SAW resonators

机译：表面声波谐振器中与表面有关的相位噪声

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With the advent of nanotechnologies, electronic devices are shrinking in thickness and width to reduce mass and, thereby, increase frequency and speed. Lithographic approaches are capable of creating metal connections with thickness and lateral dimensions down to about 20 nm, approaching the molecular scale. As a result, the dimensions of outer particles are comparable with, or even larger than, those of active or passive regions in electronics devices. Therefore, directing our attention toward the effect of surface fluctuations is of practical significance. In fact, electronic device surface-related phenomena have already received more and more attention as device size decreases. In connection with surface phase noise, selection of a suitable device with high surface sensitivity is important. In this paper, high Q-value surface acoustic wave resonators were employed because of their strong sensitivity to surface perturbation. Phase noise in SAW resonators related to surface particle motion has been examined both theoretically and experimentally. This kind of noise has been studied from the point of view of a stochastic process resulting from particle molecular adsorption and desorption. Experimental results suggest that some volatile vapors can change flicker noise 1/f and random walk noise 1/f/sup 2/. An analysis has been made indicating that these effects are not associated with Q value variation, but are generated by the change in the dynamic rate of adsorption and desorption of surface particles. Research on particle motion above the device substrate might explain the differences observed from the model based only on the substrate itself. Results might lead to a better understanding of the phase noise mechanism in micro-electronic devices and help us to build oscillators with improved performance.
机译：随着纳米技术的出现，电子设备的厚度和宽度正在缩小以减小质量，从而增加了频率和速度。光刻方法能够形成厚度和横向尺寸低至约20 nm（接近分子尺度）的金属连接。结果，外部粒子的尺寸与电子设备中的有源或无源区域的尺寸相当甚至更大。因此，将注意力转移到表面起伏的影响上具有实际意义。实际上，随着设备尺寸的减小，与电子设备表面相关的现象已经受到越来越多的关注。对于表面相位噪声，选择具有高表面灵敏度的合适设备很重要。本文使用高Q值表面声波谐振器，因为它们对表面扰动具有很强的敏感性。理论上和实验上都研究了声表面波谐振器中与表面粒子运动有关的相位噪声。已经从粒子分子吸附和解吸产生的随机过程的角度研究了这种噪声。实验结果表明，某些挥发性蒸气可以改变闪烁噪声1 / f和随机行走噪声1 / f / sup 2 /。进行了分析，表明这些影响与Q值变化无关，而是由表面颗粒吸附和解吸的动态速率变化产生的。对器件基板上方的粒子运动的研究可能解释了仅基于基板本身从模型中观察到的差异。结果可能会导致人们更好地了解微电子设备中的相位噪声机制，并有助于我们构建性能得到改善的振荡器。

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