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首页> 外文期刊>Inorganic materials: applied research >The Effect of Electron Irradiation of K-208 Glass on the Contamination of Its Surface by High Molecular Weight Compounds
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The Effect of Electron Irradiation of K-208 Glass on the Contamination of Its Surface by High Molecular Weight Compounds

机译：电子辐照K-208玻璃对高分子化合物污染其表面的影响

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摘要

The effect of electron irradiation of K-208 glass on the process of deposition of the products of thermostimulated gas emission from a high molecular weight composite is studied. The samples are irradiated in a vacuum chamber at a pressure of 10~(-4) Pa with electrons with an energy of 30 keV at flux densities ranging from 10~(10) to 2 × 10~(11) cm~(-2) s~(-1). The sample surfaces are investigated by the methods of atomic force microscopy (AFM). It is shown that the formation of impurity films is significantly affected by the surface structural changes caused by electrostatic discharges, the nature of which depends on the electron flux density.
机译：研究了K-208玻璃的电子辐照对高分子量复合材料热刺激气体发射产物沉积过程的影响。样品在10〜（-4）Pa的真空室中用能量为30 keV的电子以10〜（10）至2×10〜（11）cm〜（-2）的通量密度照射）s〜（-1）。样品表面通过原子力显微镜（AFM）的方法进行研究。结果表明，杂质膜的形成受静电放电引起的表面结构变化的影响很大，静电放电的性质取决于电子通量密度。

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