Features of Formation of Germanium Silicate Glasses during Oxidation of Nanostructured Films of Germanium-Doped Polycrystalline Silicon

A. A. Kovalevskii; A. S. Strogova; D. V. Plyakin

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Features of Formation of Germanium Silicate Glasses during Oxidation of Nanostructured Films of Germanium-Doped Polycrystalline Silicon

机译：掺锗多晶硅纳米结构薄膜氧化过程中硅酸锗玻璃的形成特征

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Nanostructured films of polycrystalline silicon obtained by joint pyrolysis of monosilanc (SiH_4) and monogermane (GeH_4) were oxidized in a medium of dry and wet oxygen. As a result of their oxidation, vitreous films of complex oxides of germanium and silicon, germanium silicate glass (GSG), is formed. It is established that the presence of germanium in the composition of nanostructured films of polycrystalline silicon (NSF PCS) increases their reaction ability with respect to oxidation. Using the methods of IR spectroscopy, XPE spectroscopy, Auger spectroscopy, and thermal analysis, the composition and phase transformation of vitreous oxides formed in the course of oxidation of NSF PCS are investigated. It is shown that the composition and phase transformation of the films of vitreous silicon and germanium oxides depend on the germanium content in the NSF PCS and conditions of their oxidation.

机译：通过单硅烷基（SiH_4）和单锗烷（GeH_4）联合热解获得的多晶硅纳米结构膜在干和湿氧的介质中被氧化。由于它们的氧化，形成了锗和硅的复合氧化物玻璃态膜，即硅酸锗玻璃（GSG）。已经确定，在多晶硅的纳米结构膜（NSF PCS）的组成中锗的存在增加了它们关于氧化的反应能力。使用红外光谱，XPE光谱，俄歇光谱和热分析方法，研究了NSF PCS氧化过程中形成的玻璃氧化物的组成和相变。结果表明，玻璃态硅和锗氧化物薄膜的组成和相变取决于NSF PCS中的锗含量及其氧化条件。

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《Inorganic materials》 |2009年第5期|574-578|共5页
作者
A. A. Kovalevskii; A. S. Strogova; D. V. Plyakin;
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Belarussian State University of Information Science and Radioengineering, Minsk, Belarus;

Belarussian State University of Information Science and Radioengineering, Minsk, Belarus;

Belarussian State University of Information Science and Radioengineering, Minsk, Belarus;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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1. Polycrystalline GexSi1-x thin film formation by chemical vapor deposition using silicon difluoride and germanium tetrachloride as precursors [J] . Lee CY., Liu CS., Chang WT. Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2001,第2期

机译：使用二氟化硅和四氯化锗作为前体通过化学气相沉积法形成多晶GexSi1-x薄膜
2. Formation of (111) nanotwin lamellae hillocks in polycrystalline silicon thin films caused by deposition of silicon dioxide layer [J] . Shigeki Imai, Masayuki Fujimoto Applied Physics Letters . 2006,第2期

机译：由二氧化硅层的沉积在多晶硅薄膜中形成（111）纳米孪晶小丘
3. Notch Root Oxide Formation During Fatigue of Polycrystalline Silicon Structural Films [J] . Pierron O. N., Muhlstein C. L. Journal of Microelectromechanical Systems . 2007,第6期

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4. Peculiarities of germanium driving back from germanium-silicate glass formed in the process of oxidation of the germanium-doped polycrystalline silikon films [C] . Kovalevsky A. A., Borisevich V. M., Strogova A. S., 2010 20th International Crimean Conference Microwave and Telecommunication Technology . 2010

机译：从掺杂锗的多晶硅薄膜的氧化过程中形成的硅酸锗玻璃驱赶回锗的特殊性
5. Applications of polycrystalline silicon-germanium thin films in metal-oxide-semiconductor technologies. [D] . King, Tsu-Jae. 1994

机译：多晶硅锗薄膜在金属氧化物半导体技术中的应用。
6. Structure deformation of indium oxide from nanoparticles into nanostructured polycrystalline films by in situ thermal radiation treatment [O] . Su Kong Chong, Siti Nur Azieani Azizan, Kee Wah Chan, 2013

机译：原位热辐射处理氧化铟从纳米粒子到纳米结构多晶膜的结构变形
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8. Radiation Damage of Germanium-Doped Silica Glasses: Spectral Simplification by Photo- and Thermal Bleaching, Spectral Identification and Microwave Saturation Characteristics [R] . Chamulitrat, W., Kevan, L., Schwartz, R. N., 1986

机译：锗掺杂二氧化硅玻璃的辐射损伤：通过光热漂白，光谱鉴定和微波饱和特性进行光谱简化

Features of Formation of Germanium Silicate Glasses during Oxidation of Nanostructured Films of Germanium-Doped Polycrystalline Silicon

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