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Structure and Properties of Metal Nitride Films Produced by Ion Implantation

机译:离子注入制备金属氮化物膜的结构和性能

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摘要

Nitride films are grown on Ti, Ta, Mo, W, Ni, Si(111), and NaCl (100) substrates by ion implantation, and their phase composition, structure, and properties are studied. The films produced using a titanium target are multiphase and contain, in addition to TiN and Ti_2N (and minor amounts of nitrides of the substrate metal), TiO_2 and oxides of the substrate metal in the form of islands 0.04 to 0.2 μm in size, distributed at random over the film. The presence of several phases in the films determines their mechanical and electrical properties and ensures good adhesion and corrosion resistance.
机译:通过离子注入在Ti,Ta,Mo,W,Ni,Si(111)和NaCl(100)衬底上生长氮化膜,并研究其相组成,结构和性能。使用钛靶材生产的薄膜是多相的,并且除了TiN和Ti_2N(以及少量的基底金属的氮化物)外,还包含TiO_2和基底金属的氧化物,呈岛状,尺寸为0.04至0.2μm在电影中随机播放。薄膜中存在多个相决定了它们的机械和电气性能,并确保了良好的附着力和耐腐蚀性。

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