High-Rate IR Laser Evaporation of Silica Glass

V. K. Sysoev; V. I. Masychev; B. P. Papchenko; S. Ya. Rusanov; A. A.Yakovlev; N. P. Glukhoedov

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High-Rate IR Laser Evaporation of Silica Glass

机译：石英玻璃的高速红外激光蒸发

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摘要

IR (10.6 μm) laser irradiation of silica glass preforms ensures rapid evaporation of the surface layer. The resulting deposit consists of amorphous SiO_2 with a particle size of ～70 nm.

机译：二氧化硅玻璃预成型坯的IR（10.6μm）激光照射可确保表面层快速蒸发。生成的沉积物由粒径约为70 nm的无定形SiO_2组成。

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来源
《Inorganic materials》 |2003年第5期|p.532-537|共6页
作者
V. K. Sysoev; V. I. Masychev; B. P. Papchenko; S. Ya. Rusanov; A. A.Yakovlev; N. P. Glukhoedov;
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作者单位

Babakin Research Center (Federal State Unitary Enterprise), Khimki, Moscow oblast, Russia;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;
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High-Rate IR Laser Evaporation of Silica Glass

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