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Comparison of Low Field Electron Transport in Zincblende and Wurtzite 6H-SiC Structures for High Gain Device Modeling

机译:高增益器件建模中Zincblende和Wurtzite 6H-SiC结构中低场电子传输的比较

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摘要

Temperature and doping dependencies of electron mobility in both wurtzite and zincblende 6H-SiC structures have been calculated using an Iteravive technique. The following scattering mechanisims, i.e., impurity, polar optical phonon, acoustic phonon, piezoelectric and electron plasmon are inculded in the calculation. Ionized imurity scattering has been treated beyound the born approximation using the phase-shift analysis. It is found that the electron mobility decreases monotonically as the temperature increases from 100-600 K. The low temperature value of electron mobilty increases significantly with increasing doping concentration. The iterative results are in fair agreement with other recent calculations obtained using the relaxation-time approximation and experimental methods.
机译:已使用Iteravive技术计算了纤锌矿和闪锌矿6H-SiC结构中电子迁移率的温度和掺杂依赖性。计算中涉及以下散射机制,即杂质,极性光学声子,声子,压电和电子等离激元。已使用相移分析在天生近似值附近对电离杂质散射进行了处理。发现随着温度从100-600 K升高,电子迁移率单调降低。随着掺杂浓度的增加,电子迁移率的低温值显着增加。迭代结果与使用弛豫时间近似和实验方法获得的其他最新计算结果完全吻合。

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