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Semi-analytic approximation of the temperature field resulting from moving heat loads

机译:由热负荷引起的温度场的半解析近似

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摘要

Moving heat load problems appear in many manufacturing processes, such as lithography, welding, grinding, and additive manufacturing. The simulation of moving heat load problems by the finite-element method poses several numerical challenges, which may lead to time consuming computations. In this paper, we propose a 2D semi-analytic model in which the problem in two spatial dimensions is decoupled into three problems in one spatial dimension. This decoupling significantly reduces the computational time, but also introduces an additional error. The method is applied to a wafer heating example, in which the computational time is reduced by a factor 10 at the cost of a 4% error in the temperature field.
机译:移动热负荷问题出现在许多制造过程中,例如光刻,焊接,研磨和增材制造。通过有限元方法对运动热负荷问题进行仿真带来了一些数值挑战,这可能会导致计算耗时。在本文中,我们提出了一个二维半解析模型,其中将两个空间维度的问题解耦为一个空间维度的三个问题。这种去耦大大减少了计算时间,但同时也带来了额外的误差。该方法被应用于晶片加热示例,在该示例中,计算时间减少了10倍,但代价是温度场的误差为4%。

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