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Analysis of the evaporation and re-condensation processes induced by pulsed beam treatments

机译:脉冲束处理引起的蒸发和再冷凝过程分析

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摘要

A physical model is proposed to describe the evaporation phenomena taking place at the surface of pulsed energetic beam treated samples. Samples of a NiTi alloy and a TiAl based alloy were subjected to high current pulsed electron beam (HCPEB) treatment for an increasing number of irradiation (5,10 and 20 pulses). The results of their surface chemistry analysis have been confronted to the model. For the sample treated with 5 pulses, the experimental composition profiles revealed a selective evaporation of Ni over Ti in the NiTi alloy and Al over Ti, Cr, Nb in the TiAl based alloy, which is nicely reproduced by the simulated composition profiles. As the number of pulses increases, the results show that a part of the vapour re-condensed onto the surface. This leads to an inversion of the composition profile at the top surface of the samples, which cannot be predicted by the theoretical model. This cyclic process of evaporation and recondensation leads to the cyclic variation of compositions in the surface layer.
机译:提出了一个物理模型来描述在脉冲高能束处理过的样品表面发生的蒸发现象。对NiTi合金和TiAl基合金的样品进行高电流脉冲电子束(HCPEB)处理,以增加照射次数(5、10和20个脉冲)。他们的表面化学分析的结果已经与模型相对。对于用5个脉冲处理的样品,实验组成曲线显示NiTi合金中Ti上方的Ni选择性蒸发,而TiAl基合金中的Al上方的Ti,Cr,Nb上方的Al选择性蒸发,通过模拟的组成曲线可以很好地再现。随着脉冲数的增加,结果表明一部分蒸气重新冷凝到表面上。这导致样品顶表面的成分分布发生反转,这无法通过理论模型进行预测。蒸发和再冷凝的这种循环过程导致表面层中成分的循环变化。

著录项

  • 来源
    《International Journal of Heat and Mass Transfer》 |2013年第9期|1172-1182|共11页
  • 作者单位

    Shanghai Engineering Research Center of Mg Materials and Applications, Shanghai Jiao Tong University, Shanghai 200240, PR China,National Engineering Research Center of Light Alloy Net Forming, Shanghai Jiao Tong University, Shanghai 200240, PR China,State Key Laboratory of Metal Matrix Composite & School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, PR China,Universiti de Lorraine, Laboratoire d'Etude des Microstructures et de Micanique des Matiriaux (LEM3), UMR 7239, He du Saulcy, Metz F-57045, France,Universiti de Lorraine, Laboratory of Excellence on Design of Alloy Metals for low-mass Structures (DAMAS), Metz, France,School of Materials Science and Engineering, Shanghai Jiao Tong University, 800 Dongchuan Road, Minghang District, Shanghai 200240, PR China;

    School of Materials Engineering, Shanghai University of Engineering Science, Shanghai 201620, PR China;

    Universiti de Lorraine, Laboratoire d'Etude des Microstructures et de Micanique des Matiriaux (LEM3), UMR 7239, He du Saulcy, Metz F-57045, France,Universiti de Lorraine, Laboratory of Excellence on Design of Alloy Metals for low-mass Structures (DAMAS), Metz, France,Laboratory of Materials Modification by Laser, Electron and Ion Beams, Dalian University of Technology, Dalian 116024, PR China;

    Universiti de Lorraine, Laboratory of Excellence on Design of Alloy Metals for low-mass Structures (DAMAS), Metz, France,Laboratory of Materials Modification by Laser, Electron and Ion Beams, Dalian University of Technology, Dalian 116024, PR China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    High current pulsed electron beam (HCPEB); Surface treatment; Evaporation; Diffusion; Numerical simulation;

    机译:大电流脉冲电子束(HCPEB);表面处理;蒸发;扩散;数值模拟;

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