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Modeling and characterisation of depletion of aluminium in bond coat and growth of mixed oxides in thermal barrier coatings

机译:粘合涂层铝耗尽及热阻挡涂层混合氧化物生长的建模与表征

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Most existing thermal barrier coating (TBC) studies do not account for the depletion of Al in the BC and growth of mixed oxides (MOs). In this complementary study, we modify and extend our earlier (Lim and Meguid in Mater Des, 2019. 10.1016/j.matdes.2018.107543) coupled finite volume (FV)-finite element (FE) formulations to incorporate diffusion reactions of Al and Cr in the BC. The modified/expanded FV-FE formulations are supported by the introduction of appropriate diffusion-reaction equations and high temperature oxidation model. Three aspects of the work were accordingly examined. Firstly, the FV model is used to describe the diffusion and reaction of Al and O-2 in the formation of alpha-Al2O3. The beta-phase rate of depletion predicted by the model agrees well with experimental findings. Secondly, the diffusion of Cr through the TGO that leads to the formation of an external layer of MOs is simulated using the FV model. Our simulations reveal that MOs form in the early stage of thermal exposure, although there are sufficient Al in the BC to sustain the growth of alpha-Al2O3 phase. We reasoned this to the formation of internal oxides and diffusion cell in the BC. Lastly, we studied the effect of roughness on beta-phase depletion and growth of TGO (alpha-Al2O3 + MOs). We show that beta-phase in the peak of undulation depletes faster and the interface between the beta + gamma phase and gamma phase in the BC straightens over time. Furthermore, our results reveal that MOs tend to form in the valley of undulation due to the shorter diffusion path.
机译:大多数现有的热障涂层(TBC)研究不考虑BC中Al的耗尽和混合氧化物(MOS)的生长。在这种互补研究中,我们提前修改和扩展(LIM和MENGUID,2019年,2019年.1016 / J.Matdes.2018.107543)耦合有限体积(FV) - 掺入Al和Cr的扩散反应的二氨酸元素(Fe)制剂在BC。通过引入适当的扩散反应方程和高温氧化模型来支持改性/扩增的FV-Fe配方。相应地检查了这项工作的三个方面。首先,FV模型​​用于描述Al和O-2在形成α-Al2O3的扩散和反应。模型预测的耗尽的β相率与实验结果很好。其次,使用FV模型模拟CR通过TGO导致形成外部MOS外层的TGO的扩散。我们的模拟显示MOS形式在热暴露的早期阶段,尽管BC中有足够的AL以维持α-Al2O3相的生长。我们推理它在BC中形成内氧化物和扩散细胞。最后,我们研究了粗糙度对TGO(Alpha-Al2O3 + MOS)的β相消耗和生长的影响。我们表明,波动峰值中的β相耗尽,并且随着时间的推移,BCA +γ相和γ相位的β+γ相位之间的界面。此外,我们的结果表明,由于较短的扩散路径,MOS倾向于在波状谷中形成。

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