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Neural network modeling of GaAs IC material and MESFET device characteristics

机译:GaAs IC材料和MESFET器件特性的神经网络建模

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This paper provides an overview of research focused on the utilization of neurocomputing technology to model critical in-process integrated circuit material and device characteristics. Artificial neural networks are employed to develop models of complex relationships between material and device characteristics at critical stages of the semiconductor fabrication process. Measurements taken and subsequently used in modeling include doping concentrations, layer thicknesses, planar geometries, resistivities, device voltages, and currents. The neural network architecture utilized in this research is the multilayer perceptron neural network (MLPNN). The MLPNN is trained in the supervised mode using the generalized delta learning rule. The MLPNN has demonstrated with good results the ability to model these characteristics, and provide an effective tool for parametric yield prediction and whole wafer characterization in semiconductor manufacturing.©1999 John Wiley & Sons, Inc. Int J RF and Microwave CAE 9: 241–253, 1999.
机译:本文概述了研究的重点,该研究的重点是利用神经计算技术对关键的过程中集成电路材料和器件特性进行建模。在半导体制造过程的关键阶段,采用人工神经网络来开发材料与器件特性之间复杂关系的模型。建模中采取并随后使用的测量包括掺杂浓度,层厚度,平面几何形状,电阻率,器件电压和电流。本研究中使用的神经网络架构是多层感知器神经网络(MLPNN)。使用广义增量学习规则在监督模式下训练MLPNN。 MLPNN已证明具有良好的建模能力,可为这些特征建模,并为半导体制造中的参数成品率预测和整个晶圆表征提供了有效的工具。©1999 John Wiley&Sons,Inc. Int J RF and Microwave CAE 9:241–第253页,1999年。

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