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首页> 外文期刊>ISIJ international >PVD TiN and CrN Coated Austempered Ductile Iron: Analysis of Processing Parameters Influence on Coating Characteristics and Substrate Microstructure
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PVD TiN and CrN Coated Austempered Ductile Iron: Analysis of Processing Parameters Influence on Coating Characteristics and Substrate Microstructure

机译：PVD TiN和CrN涂层奥氏体球墨铸铁：工艺参数对涂层特性和基体组织的影响分析

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摘要

This work studies the influence of the PVD processing parameters on the characteristics of TiN and CrN coatings deposited on ADI substrates, austempered at 360℃, with different nodule counts and surface roughnesses. Coatings were applied by arc ion plating using an industrial reactor and different sets of parameters, with BIAS voltages, arc currents, chamber pressures and substrate temperatures varying from -100 to -250 V, 60 to 65 A, 0.7 to 2.8 Pa and 280 to 450℃, respectively. The effect of the different depo sitions conditions on the substrates microstructure was also analyzed. The existing phases, preferred ori entation, surface topography, film thickness, hardness and adhesion of each coating were determined. The retained austenite content and hardness of each substrate were computed before and after coating deposition. The results obtained indicate that the different deposition conditions and coating materials evaluated do not generate significant changes neither in the resulting topography nor in the coating adhesion, which can be related to indices between HF1 and HF2. Coating adhesion was not affected by different substrate roughnesses. The combined reduction of BIAS voltage, arc current and chamber pressure leads to a decrease of TiN growth rate and hardness, while high substrate temperatures promotes an increase in TiN and CrN growth rates. Substrate temperatures around 300℃ with deposition times of up to 240 min do not promote noticeable changes on the ausferritic microstructure, while temperatures of 400℃ and above translate into a clear microstructural deterioration, even for short deposition times.
机译：这项工作研究了PVD工艺参数对ADI基底上沉积的TiN和CrN涂层的特性的影响，该基底在360℃下回火，具有不同的结节数和表面粗糙度。使用工业反应器和不同组的参数通过电弧离子镀来涂覆涂层，BIAS电压，电弧电流，腔室压力和基板温度从-100到-250 V，60到65 A，0.7到2.8 Pa和280到280不等。分别为450℃。还分析了不同沉积条件对基底微结构的影响。确定了每个涂层的现有相，优选方向，表面形貌，膜厚，硬度和附着力。在涂层沉积之前和之后，计算每个基底的残余奥氏体含量和硬度。所获得的结果表明，不同的沉积条件和所评估的涂料不会在最终的形貌和涂料附着力方面均未产生显着变化，这可能与HF1和HF2之间的指数有关。涂层附着力不受不同基材粗糙度的影响。 BIAS电压，电弧电流和腔室压力的共同降低导致TiN生长速率和硬度降低，而较高的基板温度则促使TiN和CrN生长速率提高。 300℃左右的基板温度（沉积时间长达240分钟）不会促进奥氏体组织的显着变化，而400℃及以上的温度即使在较短的沉积时间内仍会导致明显的显微组织劣化。

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  • 来源
    《ISIJ international》 |2012年第1期|p.121-126|共6页
  • 作者

    Diego Alejandro COLOMBO; Maria Dolores ECHEVERRIA; Osvaldo Julio MONCADA; Juan Miguel MASSONE;

  • 作者单位

    Mechanical Technology Group, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302, (B7608FDQ) Mar del Plata, Argentina,Metallurgy Division, INTEMA-CONICET, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302,(B7608FDQ) Mar del Plata, Argentina;

    Mechanical Technology Group, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302, (B7608FDQ) Mar del Plata, Argentina;

    Mechanical Technology Group, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302, (B7608FDQ) Mar del Plata, Argentina,Metallurgy Division, INTEMA-CONICET, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302,(B7608FDQ) Mar del Plata, Argentina;

    Metallurgy Division, INTEMA-CONICET, School of Engineering, Universidad Nacional de Mar del Plata, Av. J. B. Justo 4302,(B7608FDQ) Mar del Plata, Argentina;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    austempered ductile iron; TiN; CrN; PVD processing parameters;

    机译：奥氏体球墨铸铁;锡;CrN;PVD加工参数;

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