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首页> 外文期刊>Japanese journal of applied physics >Sodium distribution at the surface of silicon nitride film after potential-induced degradation test and recovery test of photovoltaic modules
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Sodium distribution at the surface of silicon nitride film after potential-induced degradation test and recovery test of photovoltaic modules

机译：电位诱导降解测试和光伏组件恢复测试后氮化硅膜表面的钠分布

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Migration routes of Na ions towards the surface and into SiNx films of Si cells during the potential-induced degradation (PID) test were analyzed by microscale measurements such as X-ray photoelectron spectroscopy, scanning electron microscopy, energy dispersive X-ray spectroscopy, and conductive atomic force microscopy. These measurements showed the appearance of high Na concentrations near the finger electrodes and at the top of texture structures of the SiNx film surface. However, a high current conductivity of SiNx films was observed at halfway between two finger electrodes and at the top of texture structures. These results suggest that focusing of electric fields originating from finger electrodes and the shape of texture structures affected the Na distributions and migration into the SiNx films. The influence of the PID recovery test on the Na ion migration and SiNx films is also discussed in the paper. (C) 2018 The Japan Society of Applied Physics
机译：通过X射线光电子能谱，扫描电子显微镜，能量色散X射线能谱等微尺度测量分析了在离子诱导降解（PID）测试期间Na离子向Si细胞表面和进入SiNx膜的迁移路径。导电原子力显微镜。这些测量结果表明，在指状电极附近和SiNx膜表面的纹理结构顶部出现了高Na浓度。但是，在两个指状电极之间的中途和纹理结构的顶部观察到了高导电率的SiNx膜。这些结果表明，源自手指电极的电场聚焦和纹理结构的形状会影响Na的分布并迁移到SiNx膜中。本文还讨论了PID恢复测试对Na离子迁移和SiNx膜的影响。 （C）2018日本应用物理学会

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