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首页> 外文期刊>Japanese journal of applied physics >Examination of phonon deformation potentials for accurate strain measurements in silicon-germanium alloys with the whole composition range by Raman spectroscopy
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Examination of phonon deformation potentials for accurate strain measurements in silicon-germanium alloys with the whole composition range by Raman spectroscopy

机译：通过拉曼光谱法检查声子变形势，以准确测量整个组成范围的硅锗合金中的应变

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摘要

The phonon deformation potentials (PDPs), p and q, of Si1-xGex with the whole range of the Ge concentration x were examined in detail in pursuit of accurate strain measurements by Raman spectroscopy. An oil-immersion Raman technique was adopted to extract the PDPs of Si1-xGex, in which a complex sample preparation process or a stress-introduction device is not necessary. The strain-shift coefficients b(LO) and b(TO), which can be calculated using the obtained PDPs, were compared with the values in the literature, and we suggested which values were best for application to accurate strain measurements. Ab initio calculation was also performed to understand the behavior of the PDPs throughout the whole range of x in Si1-xGex. (C) 2016 The Japan Society of Applied Physics
机译：为了通过拉曼光谱法进行精确的应变测量，详细研究了整个Ge浓度x范围内Si1-xGex的声子变形势（PDP）p和q。采用油浸拉曼技术提取Si1-xGex的PDP，无需复杂的样品制备过程或引入应力的装置。可以使用获得的PDP计算出的应变位移系数b（LO）和b（TO）与文献中的值进行比较，我们建议最适合精确应变测量的值。还进行了从头算计算，以了解PDP在Si1-xGex中整个x范围内的行为。 （C）2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第2期|026602.1-026602.6|共6页
  • 作者

    Kosemura Daisuke; Yamamoto Shotaro; Takeuchi Kazuma; Usuda Koji; Ogura Atsushi;

  • 作者单位

    Meiji Univ, Sch Sci & Technol, Kawasaki, Kanagawa 2148571, Japan;

    Meiji Univ, Sch Sci & Technol, Kawasaki, Kanagawa 2148571, Japan;

    Meiji Univ, Sch Sci & Technol, Kawasaki, Kanagawa 2148571, Japan;

    Natl Inst Adv Ind Sci & Technol, Collaborat Res Team Green Nanoelect Ctr GNC, Tsukuba, Ibaraki 3058569, Japan;

    Meiji Univ, Sch Sci & Technol, Kawasaki, Kanagawa 2148571, Japan;

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