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首页> 外文期刊>Japanese journal of applied physics >Stress and stress relaxation behaviors of multi-layered polarizer structures under a reliability test condition characterized by use of a bending beam technique
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Stress and stress relaxation behaviors of multi-layered polarizer structures under a reliability test condition characterized by use of a bending beam technique

机译:多层偏振片结构在采用弯曲梁技术表征的可靠性测试条件下的应力和应力松弛行为

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摘要

The bending curvature, stresses, and stress relaxation of various multi-layered structures with different adhesive layers pertaining to the polarizer in a thin-film transistor liquid-crystal display (TFT-LCD) have been successfully characterized by using bending beam technique under reliability test. To be more specific, three different types of pressure-sensitive adhesive (hard-, middle-, and soft-type) and various poly(vinyl alcohol) (PVA) stretched directions are devised to examine to key stress contributors and correlations with light leakage. The shrinkage stress in stretched PVA film and stress relaxation ability of pressure-sensitive adhesives (PSA) layers are found to be the key factors determining the stress distribution and out-of-plane displacement of a polarizer stack. For hard-type PSA, its polarizer stack generates the highest bending curvature with maximum out-of-plane displacement but minimum in-plane displacement, leading to anisotropic stress distribution with high stress around the edges. On the other hand, polarizer stack with soft-type PSA yields the maximum in-plane displacement but the minimum out-of-plane displacement, resulting in isotropic stress distribution. (C) 2015 The Japan Society of Applied Physics
机译:薄膜晶体管液晶显示器(TFT-LCD)中偏光片所属的具有不同粘合剂层的各种具有不同粘合剂层的多层结构的弯曲曲率,应力和应力松弛已通过可靠性测试中的弯曲束技术成功表征。更具体地说,设计了三种不同类型的压敏胶(硬,中和软型)和各种聚乙烯醇(PVA)拉伸方向,以研究关键的应力起因和与漏光的关系。 。发现拉伸的PVA膜中的收缩应力和压敏胶粘剂(PSA)层的应力松弛能力是决定偏振片堆叠的应力分布和面外位移的关键因素。对于硬型PSA,其偏光片堆叠产生最大的弯曲曲率,具有最大的平面外位移,但具有最小的平面内位移,从而导致各向异性应力分布,且边缘周围的应力较高。另一方面,具有软型PSA的偏光片堆叠可产生最大的平面内位移,但产生最小的平面外位移,从而产生各向同性的应力分布。 (C)2015年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2015年第4期|046601.1-046601.7|共7页
  • 作者单位

    Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30049, Taiwan;

    Innolux Corp, Dev Technol Dept, Tainan 74147, Taiwan;

    Innolux Corp, Dev Technol Dept, Tainan 74147, Taiwan;

    Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30049, Taiwan;

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