Formation of ultralow-reflectance silicon surface by dry etching

Zhang Li; Yang Fang; He Jun; Huang Xian; Zhang Dacheng

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Formation of ultralow-reflectance silicon surface by dry etching

机译：通过干法刻蚀形成超低反射率硅表面

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In this study, a one-step method of fabricating nano to micro structures was reported. Monte Carlo (MC) simulation and a fluid equation were employed to study the formation and evolution mechanism. To verify the fundamental simulation and hypothetical mechanism, standard surface technology (STS) was used with a phase delay producer to build the etching system. Also, throughout the practical experiment, the relationship between the structure scale and the process parameter was recorded. Lastly, the reflectance was measured to be only 0.9%, proving that this method was very promising for optical application. (C) 2015 The Japan Society of Applied Physics

机译：在这项研究中，报道了一种制备纳米至微观结构的一步法。采用蒙特卡罗模拟和流体方程研究了形成和演化机理。为了验证基本的模拟和假设机制，将标准表面技术（STS）与相位延迟产生器一起使用来构建蚀刻系统。此外，在整个实际实验中，记录了结构尺寸和工艺参数之间的关系。最后，测得的反射率仅为0.9％，证明该方法对光学应用非常有前途。（C）2015年日本应用物理学会

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《Japanese journal of applied physics》 |2015年第4s期|04DR07.1-04DR07.4|共4页
作者
Zhang Li; Yang Fang; He Jun; Huang Xian; Zhang Dacheng;
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Peking Univ, Inst Microelect, Natl Key Lab Sci & Technol Micro Nano Fabricat, Beijing 100871, Peoples R China.;

Peking Univ, Inst Microelect, Natl Key Lab Sci & Technol Micro Nano Fabricat, Beijing 100871, Peoples R China.;

Peking Univ, Inst Microelect, Natl Key Lab Sci & Technol Micro Nano Fabricat, Beijing 100871, Peoples R China.;

Peking Univ, Inst Microelect, Natl Key Lab Sci & Technol Micro Nano Fabricat, Beijing 100871, Peoples R China.;

Peking Univ, Inst Microelect, Natl Key Lab Sci & Technol Micro Nano Fabricat, Beijing 100871, Peoples R China.;

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Formation of ultralow-reflectance silicon surface by dry etching

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