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首页> 外文期刊>Japanese journal of applied physics >Orientation- and position-controlled alignment of asymmetric silicon microrod on a substrate with asymmetric electrodes
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Orientation- and position-controlled alignment of asymmetric silicon microrod on a substrate with asymmetric electrodes

机译：具有不对称电极的基板上不对称硅微棒的取向和位置控制对准

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摘要

In this paper, we demonstrate the orientation-controlled alignment of asymmetric Si microrods on a glass substrate with an asymmetric pair of electrodes. The Si microrods have the shape of a paddle with a blade and a shaft part, and the pair of electrodes consists of a narrow electrode and a wide electrode. By applying AC bias to the electrodes, the Si microrods suspended in a fluid align in such a way to settle across the electrode pair, and over 80% of the aligned Si microrods have an orientation with the blade and the shaft of the paddle on the wide and the narrow electrodes, respectively. When Si microrods have a shell of dielectric film and its thickness on the top face is thicker than that on the bottom face, 97.8% of the Si microrods are aligned with the top face facing upwards. This technique is useful for orientation-controlled alignment of nano- and microsized devices that have polarity or a distinction between the top and bottom faces.
机译：在本文中，我们演示了具有不对称电极对的玻璃基板上不对称Si微棒的取向控制取向。 Si微棒具有带叶片和轴部的桨状，一对电极由窄电极和宽电极构成。通过向电极施加AC偏压，悬浮在流体中的Si微棒以这样的方式对齐，从而在整个电极对上沉降，超过80％对齐的Si微棒的方向与刀片和桨叶的轴一致。宽和窄电极。当Si微棒具有介电膜的壳并且其在顶面上的厚度比在底面上的厚度厚时，97.8％的Si微棒与顶面向上对准。此技术对于具有极性或顶面与底面之间有区别的纳米和微型设备的方向控制对齐很有用。

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  • 来源
    《Japanese journal of applied physics》 |2014年第3期|036506.1-036506.7|共7页
  • 作者

    Akihide Shibata; Keiji Watanabe; Takuya Sato; Hiroshi Kotaki; Paul J. Schuele; Mark A. Crowder; Changqing Zhan; John W. Hartzell; Ryoichi Nakatani;

  • 作者单位

    Advanced Technology Research Laboratories, Corporate Research and Development Division, Sharp Corporation, Tenri, Nara 632-8567, Japan;

    Advanced Technology Research Laboratories, Corporate Research and Development Division, Sharp Corporation, Tenri, Nara 632-8567, Japan;

    Advanced Technology Research Laboratories, Corporate Research and Development Division, Sharp Corporation, Tenri, Nara 632-8567, Japan;

    Advanced Technology Research Laboratories, Corporate Research and Development Division, Sharp Corporation, Tenri, Nara 632-8567, Japan;

    Sharp Laboratories of America, Camas, WA 98607, U.S.A.;

    Sharp Laboratories of America, Camas, WA 98607, U.S.A.;

    Sharp Laboratories of America, Camas, WA 98607, U.S.A.;

    Sharp Laboratories of America, Camas, WA 98607, U.S.A.;

    Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan;

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