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首页> 外文期刊>Japanese journal of applied physics >Observation of inactivation of Bacillus sbtilis spores under exposures of oxygen added argon atmospheric pressure plasma jet
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Observation of inactivation of Bacillus sbtilis spores under exposures of oxygen added argon atmospheric pressure plasma jet

机译:氧暴露于氩气的大气压等离子体射流暴露下枯草芽孢杆菌孢子的失活观察

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摘要

The inactivation of Bacillus subtilis spores by an Ar plasma jet mixed with different amounts of oxygen is reported. 5.8 × 10~6 S. subtilis spores are sterilized by an Ar/O_2 (8.7%) plasma jet after exposure for 2 min. The densities of ozone and oxygen radicals in the Ar/O_2 plasma jet increase with oxygen concentration and are estimated by optical spectroscopy diagnostic. The malondialdehyde (MDA) test shows that oxygen radicals participate in bacterial inactivation. Scanning electron microscopy (SEM) reveals the deformation of the spore shape due to etching by oxygen radicals and the dependence of the degree of deformation on the density of oxygen radicals.
机译:报道了通过混合有不同量氧气的Ar等离子体射流使枯草芽孢杆菌孢子失活。暴露2分钟后,通过Ar / O_2(8.7%)等离子流对5.8×10〜6枯草链球菌的孢子进行灭菌。 Ar / O_2等离子体射流中的臭氧和氧自由基的密度随氧浓度的增加而增加,并通过光谱诊断法进行估算。丙二醛(MDA)测试表明氧自由基参与细菌灭活。扫描电子显微镜(SEM)揭示了由于氧自由基腐蚀引起的孢子形状变形,以及变形程度对氧自由基密度的依赖性。

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  • 来源
    《Japanese journal of applied physics》 |2014年第11期|110310.1-110310.4|共4页
  • 作者单位

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China, Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong, China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China, Department of Resources and Environment, Henan Agricultural University, Zhengzhou, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, P. R. China;

    Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong, China;

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