This special issue consists of peer-reviewed papers based on presentations at the 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2011) held at Nagoya Institute of Technology, Nagoya, Japan during March 6-9, 2011. The symposium is sponsored by Aichi Science & Technology Foundation and ISPlasma2011 Organizing Committee, associated with the project "Tokai Region Nanotechnology Manufacturing Cluster", implemented by MEXT (Ministry of Education, Culture, Sports, Science and Technology) Knowledge Cluster Initiative.
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