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首页> 外文期刊>Japanese journal of applied physics >Silicon Based System for Single-Nucleotide-Polymorphism Detection: Chip Fabrication and Thermal Characterization of Polymerase Chain Reaction Microchamber
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Silicon Based System for Single-Nucleotide-Polymorphism Detection: Chip Fabrication and Thermal Characterization of Polymerase Chain Reaction Microchamber

机译:基于硅的单核苷酸多态性检测系统:芯片制备和聚合酶链反应微腔室的热表征

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摘要

A single nucleotide polymorphism (SNP) is a difference in the DNA sequence of one nucleotide only. We recently proposed a lab-on-a-chip (LoC) system which has the potentiality of fast, sensitive and highly specific SNP detection. Most of the chip components are silicon based and fabricated within a single process. In this paper, the newly developed fabrication method for the silicon chip is presented. The robust and reliable process allows etching structures on the same chip with very different aspect ratios. The characterization of a crucial component to the LoC SNP detector, the microreactor where DNA amplification is performed, is also detailed. Thanks to innovative design and fabrication methodologies, the microreactor has an excellent thermal isolation from the surrounding silicon substrate. This allows for highly localized temperature control. Furthermore, the microreactor is demonstrated to have rapid heating and cooling rates, allowing for rapid amplification of the target DNA fragments. Successful DNA amplification in the microreactor is demonstrated.
机译:单核苷酸多态性(SNP)是仅一个核苷酸的DNA序列差异。我们最近提出了一种芯片实验室(LoC)系统,该系统具有快速,灵敏和高度特异性SNP检测的潜力。大多数芯片组件都是基于硅的,并在单个过程中制造。本文介绍了新开发的硅芯片制造方法。稳健而可靠的过程允许在同一芯片上以不同的纵横比蚀刻结构。还详细描述了LoC SNP检测器(进行DNA扩增的微反应器)的关键组件的特征。得益于创新的设计和制造方法,微反应器与周围的硅基板具有出色的热隔离性能。这允许高度局部的温度控制。此外,已证明微反应器具有快速的加热和冷却速率,从而可以快速扩增靶DNA片段。证明了在微反应器中成功的DNA扩增。

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  • 来源
    《Japanese journal of applied physics》 |2012年第4issue2期|p.04DL01.1-04DL01.9|共9页
  • 作者单位

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Imec vwz., Kapeldreef 75, B-3001 Leuven, Belgium;

    Advanced Technology Research Laboratory, Panasonic Corporation, Seika, Kyoto 619-0237, Japan;

    Advanced Technology Research Laboratory, Panasonic Corporation, Seika, Kyoto 619-0237, Japan;

    Advanced Technology Research Laboratory, Panasonic Corporation, Seika, Kyoto 619-0237, Japan;

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