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首页> 外文期刊>Japanese journal of applied physics.Part 1.Regular papers & short notes >Near-Infrared Polarizer with Tungsten Silicide Wire Grids
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Near-Infrared Polarizer with Tungsten Silicide Wire Grids

机译:硅化钨丝栅的近红外偏振器

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摘要

We fabricated a near-infrared wire-grid polarizer consisting of a 230-nm-pitch tungsten silicide (WSi) grating on a SiO_2 substrate using two-beam interference lithography and dry etching. The transverse magnetic (TM) polarization transmittance of the fabricated polarizer exceeded 80% in the 1000-1600-nm wavelength range. The extinction ratio was higher than 20dB in the 650-1500-nm wavelength range. We also measured the extinction coefficient κ of WSi and verified that WSi is a suitable polarizing material in the near-infrared range.
机译:我们使用两束干涉光刻和干法刻蚀,在SiO_2衬底上制造了一个由230 nm间距的硅化钨(WSi)光栅组成的近红外线栅偏振器。所制造的偏振器的横向磁(TM)偏振透射率在1000-1600 nm波长范围内超过80%。在650-1500nm波长范围内,消光比高于20dB。我们还测量了WSi的消光系数κ,并验证了WSi是适合近红外范围的偏振材料。

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  • 来源
    《Japanese journal of applied physics.Part 1.Regular papers & short notes》 |2011年第1issue1期|p.012502.1-012502.3|共3页
  • 作者单位

    Department of Electronic Systems Engineering School of Engineering, The University of Shiga Prefecture, Hikone, Shiga 522-8533, Japan;

    National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan;

    Research Institute for Electronic Science, Hokkaido University, Sapporo 060-0812, Japan;

    Department of Electronics and Informatics, Ryukoku University, Otsu 520-2194, Japan;

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