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首页> 外文期刊>Japanese journal of applied physics >Effects of Concentration of Nanoscale Tin-Doped Indium Oxide on Electrical Breakdown of High-Resistance Liquid Crystal
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Effects of Concentration of Nanoscale Tin-Doped Indium Oxide on Electrical Breakdown of High-Resistance Liquid Crystal

机译:纳米锡掺杂铟的浓度对高电阻液晶电击穿的影响

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摘要

According to our previous study, a high concentration of nanoscale tin-doped indium oxide (ITO) may be beneficial for protecting liquid crystal (LC) against attacks by electrostatic discharge (ESD). In this study, the influence of high-voltage stresses in an ESD test was investigated for cells doped with different concentrations of ITO. It was found that nano-ITO with a concentration of 0.4% in weight ratio deteriorated the physical properties of LC of transparency transition and charge retention. However, our experiment showed that the capability of ESD protection for the doped LC was still improved at the ITO concentration of 0.4 wt %. This finding supports the proposed model in our previous report. The role of ITO in the LC is not always beneficial, as discussed in this paper.
机译:根据我们先前的研究,高浓度的纳米级掺锡氧化铟(ITO)可能有益于保护液晶(LC)免受静电放电(ESD)的侵蚀。在这项研究中,针对掺有不同浓度ITO的电池,研究了ESD测试中高压应力的影响。发现以0.4重量%的浓度存在的纳米ITO降低了透明过渡和电荷保持的LC的物理性能。但是,我们的实验表明,在0.4 wt%的ITO浓度下,掺杂LC的ESD保护能力仍得到改善。这一发现支持了我们先前报告中提出的模型。如本文所述,ITO在LC中的作用并不总是有益的。

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