Fabrication of Ni/AI_2O_3/Ni Heteroepitaxial Junction by Post-Hydrogen Reduction of NiO/AI_2O_3/NiO Trilayered Epitaxial Thin Film

著录项

• 来源
  《Japanese journal of applied physics》 |2011年第9issue1期|p.098004.1-098004.2|共2页
• 作者

  Ryosuke Yamauchi; Keisuke Kobayashi; Makoto Hosaka; Toshimasa Suzuki; Kohji Koyama; Akifumi Matsuda; Hideki Arai; Yushi Kato; Masahiko Mitsuhashi; Satoru Kaneko; Mamoru Yoshimoto;

  展开▼
• 作者单位

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  Taiyo Yuden Co., Ltd., Takasaki, Gunma 370-3347, Japan;

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  Taiyo Yuden Co., Ltd., Takasaki, Gunma 370-3347, Japan;

  Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan;

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan;

  Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan;

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Patent Attorney, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  展开▼
• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词