Influence of Rapid Thermal Annealing on Raman Scattering of InN Epilayers

著录项

• 来源
  《Japanese journal of applied physics》 |2010年第10期|p.105803.1-105803.4|共4页
• 作者

  Min-De Yang; Shih-Chang Tong; I-Tin Chou; Gia-Wei Shu; Ji-Lin Shen; Yueh-Chien Lee; Ying-Sheng Huang; Yang-Fang Chen; Tai-Yuan Lin;

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• 作者单位

  Department of Physics, Chung Yuan Christian University, Chungli 32023, Taiwan;

  Department of Physics, Chung Yuan Christian University, Chungli 32023, Taiwan;

  Department of Physics, Chung Yuan Christian University, Chungli 32023, Taiwan;

  Department of Physics, Chung Yuan Christian University, Chungli 32023, Taiwan;

  Department of Physics, Chung Yuan Christian University, Chungli 32023, Taiwan,Institute of Nuclear Energy Research, P. O. Box 3.11, Luntan 32546, Taiwan;

  Electronic Engineering Department, Tung Nan Institute of Technology, Taipei 22202, Taiwan;

  Electronic Engineering Department, National Taiwan University of Science and Technology, Taipei 10617, Taiwan;

  Department of Physics, National Taiwan University, Taipei 10617, Taiwan;

  Institute of Optoelectronic Science, National Taiwan Ocean University, Keelung 20224, Taiwan;

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• 正文语种 eng
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