Effect of Organic Additive on Surface Roughness of Polycrystalline Silicon Film after Chemical Mechanical Polishing

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• 来源
  《Japanese journal of applied physics》 |2010年第1issue1期|010216.1-010216.3|共3页
• 作者

  Hee-Sub Hwang; Jin-Hyung Park; Sok-Ho Yi; Ungyu Paik; Jea-Gun Park;

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• 作者单位

  Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791, Korea Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea;

  Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791, Korea Department of Electronics and Communications Engineering, Hanyang University, Seoul 133-791, Korea;

  Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791, Korea Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea;

  Division of Advanced Materials Science Engineering, Hanyang University, Seoul 133-791, Korea;

  Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791, Korea Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea Department of Electronics and Communications Engineering, Hanyang University, Seoul 133-791, Korea;

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• 正文语种 eng
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