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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Material Properties and Plasma Display Panel Discharging Characteristics Depending on MgO Evaporation Rate
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Material Properties and Plasma Display Panel Discharging Characteristics Depending on MgO Evaporation Rate

机译：取决于MgO蒸发速率的材料特性和等离子显示面板放电特性

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摘要

MgO thin film is most widely used as a protecting layer in ac Plasma Display Panel. The film is deposited using electron beam evaporation. The effects of the evaporation rate of MgO film deposited using an electron beam on the MgO properties and the discharge characteristics of the plasma display panel (PDP) were investigated. The evaporation rate was changed from 3 to 15 A/s at a substrate temperature of 300℃. MgO properties such as crystal orientation, surface roughness, contact angle, and film structure were inspected using X-ray diffraction (XRD), analysis atomic force microscopy (AFM), drop shape analysis, and secondary electron microscopy (SEM). The MgO properties were shown to be strongly dependent on the evaporation rate. We also studied the relation between MgO properties and PDP discharging characteristics. The minimum firing voltage and maximum luminous efficiency were obtained at an evaporation rate of 5 A/s. In the MgO film deposited at 5 A/s, the (200) orientation was most intensive and surface roughness was minimum.
机译：MgO薄膜在ac等离子显示面板中最广泛地用作保护层。使用电子束蒸发来沉积膜。研究了使用电子束沉积的MgO膜的蒸发速率对MgO性能和等离子显示面板（PDP）放电特性的影响。在基板温度为300℃时，蒸发速率从3 A / s更改为15 A / s。使用X射线衍射（XRD），分析原子力显微镜（AFM），液滴形状分析和二次电子显微镜（SEM）检查MgO特性，例如晶体取向，表面粗糙度，接触角和膜结构。氧化镁的性质显示出强烈依赖于蒸发速率。我们还研究了MgO特性与PDP放电特性之间的关系。在5 A / s的蒸发速率下获得了最小的点火电压和最大的发光效率。在以5 A / s的速度沉积的MgO膜中，（200）取向最集中，表面粗糙度最小。

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