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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Experimental Study on Favorable Properties of Compound RF Discharge Plasmas with a Tapered Shape Hollow Cathode Compared with a Plane Cathode
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Experimental Study on Favorable Properties of Compound RF Discharge Plasmas with a Tapered Shape Hollow Cathode Compared with a Plane Cathode

机译：锥形空心阴极与平面阴极相比的复合射频放电等离子体的有利特性的实验研究

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摘要

An experimental investigation on the characteristics of compound RF discharge plasmas with a tapered shape hollow-cathode (HC) compared with a plane cathode is presented for the development of processing plasma. Dense plasmas are shown to be generated in the wide range of working pressures, 3 < p < 90 Pa. It is clarified that the higher RF power yields the greater HC effect to increase the ratio of electron density with the HC to that without it. The HC effect is shown to work well for decreasing the self-bias potential compared with the plane cathode. It is clarified that the dense plasma with relatively low electron temperature produced by the compound RF discharge results from the synergetic effect of the lowered input RF power density and the effective increased discharge area due to the HC effect.
机译：提出了一种与平面阴极相比具有锥形空心阴极（HC）的复合RF放电等离子体特性的实验研究，以开发等离子体。显示出在3 <90 Pa的宽工作压力范围内会产生致密等离子体。需要说明的是，较高的RF功率会产生更大的HC效应，从而增加含HC的电子密度与不含HC的电子密度的比率。与平面阴极相比，HC效应对于降低自偏置电势表现出很好的作用。可以看出，由复合RF放电产生的具有相对较低电子温度的致密等离子体是由降低的输入RF功率密度和HC效应导致的有效增大的放电面积的协同作用产生的。

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