Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating

Mikio NAGAI; Osamu TAKAI; Masaru HORI

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Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating

机译：常压氟碳-颗粒等离子体化学气相沉积法制备疏水膜

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We have realized a fluorocarbon-particle plasma chemical vapor deposition employing an atmospheric pressure plasma with continuous-wave microwave excitation. Spherical fluorocarbon particles 50-100 nm in diameter were formed in the atmospheric pressure plasma. The gas temperature in the plasma was controlled to be 480 K, as estimated using numerical calculations from N_2 emission spectra. It was found that the gas temperature was an important factor for the synthesis of the fluorocarbon particles. The particles were negatively charged downstream from the plasma and were transported efficiently to the substrate by an electric field. A hydrophobic coating with a contact angle of 140° was achieved at room temperature.

机译：我们已经实现了采用常压等离子体和连续波微波激发的碳氟化合物颗粒等离子体化学气相沉积。在大气压等离子体中形成直径为50-100nm的球形碳氟化合物颗粒。等离子体中的气体温度控制为480 K，这是根据N_2发射光谱的数值计算得出的。发现气体温度是合成碳氟化合物颗粒的重要因素。粒子在等离子体下游带负电，并通过电场有效地传输到基板。在室温下获得具有140°接触角的疏水涂层。

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来源
《Japanese Journal of Applied Physics. Part 2, Letters & Express Letters》 |2006年第19期|p.L460-L462|共3页
作者
Mikio NAGAI; Osamu TAKAI; Masaru HORI;
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作者单位

Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
hydrophobic; atmospheric; plasma; gas temperature; fluorocarbon;

机译：疏水;大气;等离子体;气体温度;碳氟化合物;

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Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating

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