...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Variation in 111 d-Space and Generation of Hillocks in Platinum Thin-Film Electrodes by Heat Treatment
【24h】

Variation in 111 d-Space and Generation of Hillocks in Platinum Thin-Film Electrodes by Heat Treatment

机译：热处理后铂薄膜电极111 d空间的变化和小丘的产生

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The variation in 111 d-space of Pt thin-film electrodes during heat treatment was precisely measured by an X-ray diffraction system with a heating stage. The 111 d-space of Pt films deposited at 200℃ linearly increased as the temperature was increased to 450℃ and was almost constant over the temperatures range from 450 to 600℃ due to stress relaxation. The generation of hillocks was observed in the Pt films which were relaxed in this way. On the other hand, in the case of Pt films deposited at temperatures higher than 500℃, the d-space linearly increased and then linearly decreased to almost the same value in the heat treatment at a maximum temperature of 600℃, and no hillocks were observed on the surface after the heat treatment. Furthermore, Pt films prepared at room temperature (RT) at different deposition rates showed different variations in d-space and different sizes of hillocks. These results suggest that knowing the variation in 111 d-space during heat treatment is beneficial for predicting the generation of hillocks in 111-oriented Pt thin films.
机译：通过具有加热台的X射线衍射系统精确地测量了热处理期间Pt薄膜电极的111d空间中的变化。随着温度升高至450℃，在200℃沉积的Pt膜的111d空间线性增加，并且由于应力松弛，在450至600℃的温度范围内几乎恒定。在以这种方式松弛的Pt膜中观察到小丘的产生。另一方面，在高于500℃的温度下沉积Pt膜的情况下，在最高温度为600℃的热处理中，d空间线性增加然后线性减少至几乎相同的值，并且没有小丘。热处理后在表面上观察到。此外，在室温（RT）下以不同的沉积速率制备的Pt膜在d空间和小丘的尺寸不同时表现出不同的变化。这些结果表明，了解热处理过程中111d空间的变化有利于预测111取向Pt薄膜中的小丘的产生。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号