机译:具有反应物Pb(C_2H_5)_4,Zr(Ot-C_4H_9)_4,Ti(Oi-C_3H_7)的各种氧化物电极上化学气相沉积Pb(Zr_x,Ti_(1-x))O_3膜的组成和晶相控制_4和O_2
Department of Chemical Engineering, National Taiwan University of Science and Technology, 43, Keelung Road, Section 4, Taipei, Taiwan 106, R.O.C.;
lead zirconate titanate; chemical vapor deposition; lead oxide;
机译:Pb(C_2H_5)_4,Ti(i-OC_3H_7)_4,Zr(t-OC_4H_9)_4和O_2对Pb(Zr_xTi_1-x)O_3膜的化学气相沉积:从Pb(C_2H_5)_4和O_2形成氧化铅的作用胶片性能
机译:高度(100)的(Pb_(1-x)La_x)Ti_(1-x / 4)O_3 / Pb(Zr_(0.20)Ti_(0.80))O_3 /(Pb_(1-x)La_x)Ti_(1 -x / 4)O_3射频磁控溅射多层薄膜
机译:Lanio_3电极和过量氧化铅对化学溶液沉积衍生Pb(zr_x,ti_(1-x))o_3膜的影响
机译:外延Pb(Zr_x,Ti_(1-x))O_3薄膜的表征在Morphotopic相位边界附近的组合物
机译:晶体缺陷对薄膜Pb(Zr,Ti)O3中畴壁运动的影响。
机译:具有可调谐应用的PbZr0.52Ti0.48O3 / Bi1.5Zn1.0Nb1.5O7组成层的多层薄膜
机译:依赖于成分的极化转换行为 (111) - 优选的多晶pb(Zr_ {x} Ti_ {1-x})O_ {3}薄膜
机译:通过mOCVD制备的单晶pb(Zr(sub x)Ti(sub 1-x))O(sub 3)薄膜的成分特性变化