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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Analytical Model of Electrodiffusion of Metals in Fullerene Thin Films
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Analytical Model of Electrodiffusion of Metals in Fullerene Thin Films

机译:富勒烯薄膜中金属电扩散的解析模型

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摘要

This paper presents a theoretical model of doping of C_(60) thin films by the diffusion of ions from metal electrodes under the action of external electric bias. In the case of Au diffusion, the final nonlinear parabolic partial differential equation for the concentration of mobile metal ions was solved numerically by the finite difference method for a given electric current (galvanostatic operation). This yields the time evolution of ionic concentration profiles for different currents. A significant increase in the rate of Au ion penetration into C_(60) films with increasing electric current is predicted by these calculations in agreement with the published experimental observations.
机译:本文提出了一种在外部电偏压作用下通过离子从金属电极扩散而掺杂C_(60)薄膜的理论模型。在Au扩散的情况下,对于给定电流(恒电流运行),通过有限差分法对最终的抛物线非线性抛物线偏微分方程进行了数值求解。这产生了针对不同电流的离子浓度曲线的时间演变。通过这些计算与已发表的实验观察结果相一致,可以预测随着电流的增加,Au离子渗透到C_(60)膜中的速率将显着增加。

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