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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Laser-Induced Bulk Damage of Various Types of Silica Glasses at 532 and 355 nm
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Laser-Induced Bulk Damage of Various Types of Silica Glasses at 532 and 355 nm

机译:各种类型的石英玻璃在532和355 nm处的激光诱导大块损伤

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摘要

Laser-induced bulk-damage threshold (LIDT) of various types of silica glasses at 532 and 355 nm caused by lasers with pulse widths of ≈5 ns (refered as nanosecond laser [NSL]) and 30 ps (refered as picosecond laser [PSL]) were observed. The LIDTs of fused quartzes (FQs) produced by melting natural quartz powder were less than those of synthetic fused silicas (SFSs) at both wavelengths. At 355 nm, the LIDT of SFS containing 1000 ppm of Cl was almost the same as that of FQ at 1 pulse, and that at 12000 pulses was between those of SFSs and FQs. The variation of LIDT among samples for PSL is less than that for NSL.
机译:脉冲宽度约为5 ns的激光(称为纳秒激光[NSL])和30 ps的激光(称为皮秒激光[PSL])在532和355 nm处引起的各种类型石英玻璃的激光诱导的大损伤阈值(LIDT) ])进行观察。在两种波长下,通过熔融天然石英粉末而产生的熔融石英(FQ)的LIDT均小于合成熔融二氧化硅(SFS)的LIDT。在355 nm处,含有1000 ppm Cl的SFS的LIDT与1个脉冲时的FQ几乎相同,而12000个脉冲时的LIDT在SFS和FQ的之间。对于PSL,样本之间LIDT的变化小于NSL。

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