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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Structural Nonuniformity and Internal Stress in Chromium Films Deposited by Magnetron Sputtering
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Structural Nonuniformity and Internal Stress in Chromium Films Deposited by Magnetron Sputtering

机译：磁控溅射沉积铬膜的结构不均匀性和内应力

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摘要

Using high-resolution transmission electron microscopy, selected area electron diffraction and X-ray diffraction methods, the microstructures and lattice parameters of different parts of Cr films deposited by magnetron sputtering under different deposition conditions have been studied. It was revealed that the microstructure and lattice parameter of the films deposited onto nonheated substrates vary in the film thickness direction. Lattice parameter a has a maximal value in the film-substrate interface region and gradually decreases towards the conventional value in the middle and upper film parts. In accordance with this, the internal tensile stress decreases, while the grain size increases in the direction from the substrate to the film surface. Elevation of the substrate temperature results in smoothing of nonuniformity of the film microstructure and stress distribution along the thickness. At a certain combination of a substrate temperature and bias voltage, unstressed large-grained films with uniform microstructure have been deposited. The model proposed for explanation of the obtained results is based on the supposition of dynamic elevation of condensation surface temperature during film growth that promotes the formation of the film with structure and stress nonuniformly distributed in the thickness direction.
机译：利用高分辨率透射电子显微镜，选择区域电子衍射和X射线衍射方法，研究了在不同沉积条件下磁控溅射沉积Cr膜不同部位的组织和晶格参数。揭示了沉积在未加热的基板上的膜的微观结构和晶格参数在膜厚度方向上变化。晶格参数a在膜-基底界面区域具有最大值，并且在中膜和上膜部分朝着常规值逐渐减小。据此，内部拉应力减小，而晶粒尺寸沿从基板到膜表面的方向增大。衬底温度的升高导致薄膜微观结构的不均匀性和沿厚度的应力分布的平滑。在衬底温度和偏置电压的一定组合下，已经沉积了具有均匀微观结构的无应力大颗粒膜。为解释所获得的结果而提出的模型是基于在薄膜生长过程中动态凝结表面温度的假设，该动态升高会促使薄膜的结构和应力在厚度方向上分布不均匀。

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