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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes >Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O_3 Thin Films on Structural Stabilities of Hybrid Pt/IrO_2/Ir Stack and Single-Layer Ir Bottom Electrodes
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Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O_3 Thin Films on Structural Stabilities of Hybrid Pt/IrO_2/Ir Stack and Single-Layer Ir Bottom Electrodes

机译：Pb（Zr，Ti）O_3薄膜的高温金属有机化学气相沉积对混合Pt / IrO_2 / Ir叠层和单层Ir底电极结构稳定性的影响

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摘要

High-temperature Pb(Zr,Ti)O_3 (PZT) metal-organic chemical vapor deposition (MOCVD) at 620℃ was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrCb/Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigated. Severe interaction between PZT and the underlayered Pt films was observed, and the interaction resulted in a pyrochlore phase in the PZT film and blister-type deformation in the Pt film. On the other hand, structural stability, which served as the basis for a well-crystallized perovskite PZT film, was preserved in the case of the Ir electrode. Therefore, it could be determined that the Ir electrode as a bottom electrode was better than the Pt electrode from the point of view of the structural stability of a capacitor stack, when high-temperature MOCVD is chosen as a preparation method.
机译：在两个主要的底部候选电极上进行了620℃的高温Pb（Zr，Ti）O_3（PZT）金属有机化学气相沉积（MOCVD），即混合Pt / IrCb / Ir堆叠电极和单层铱电极。研究了两种PZT /电极堆的结构稳定性。观察到PZT与下层Pt膜之间存在严重的相互作用，该相互作用导致PZT膜中有烧绿石相，而Pt膜中出现了水泡型变形。另一方面，在Ir电极的情况下，保留了结构稳定性，该结构稳定性是良好结晶的钙钛矿PZT膜的基础。因此，当选择高温MOCVD作为制备方法时，从电容器堆的结构稳定性的观点来看，可以确定作为底电极的Ir电极比Pt电极更好。

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