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首页> 外文期刊>Japanese journal of applied physics >Investigation of analytical model of turn-off loss for 4H-SiC high-voltage trench insulated gate bipolar transistors
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Investigation of analytical model of turn-off loss for 4H-SiC high-voltage trench insulated gate bipolar transistors

机译:4H-SiC高压沟槽绝缘栅双极型晶体管关断损耗分析模型的研究

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摘要

In this paper, an analytical model of 4H-SiC high-voltage trench insulated gate bipolar transistors (IGBTs) turn-off loss is developed for a given operating condition and validated with a two-dimensional numerical simulation without experimental conditions. Moreover, the hole-carrier concentration profile is also modeled. The simulation results demonstrated that the analytical model is correct within an acceptable range. It has been verified that the analytical model matches well with simulation results with increasing carrier lifetime in the N-drift region. (C) 2018 The Japan Society of Applied Physics
机译:本文针对给定的工作条件建立了4H-SiC高压沟槽绝缘栅双极型晶体管(IGBT)关断损耗的分析模型,并在没有实验条件的情况下进行了二维数值模拟验证。此外,还对空穴载流子浓度分布进行了建模。仿真结果表明,该分析模型在可接受的范围内是正确的。已经证实,随着N漂移区中载流子寿命的增加,分析模型与仿真结果非常吻合。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第12期|124102.1-124102.6|共6页
  • 作者单位

    Harbin Engn Univ, Coll Informat & Commun Engn, Harbin 150001, Heilongjiang, Peoples R China;

    Hangzhou Dianzi Univ, Key Lab RF Circuits & Syst, Minist Educ, Hangzhou 310018, Zhejiang, Peoples R China;

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