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首页> 外文期刊>Journal of coatings technology and research >Chemical and electrochemical characterization of TiO_2/Al_2O_3 atomic layer depositions on AZ-31 magnesium alloy
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Chemical and electrochemical characterization of TiO_2/Al_2O_3 atomic layer depositions on AZ-31 magnesium alloy

机译：AZ-31镁合金上TiO_2 / Al_2O_3原子层沉积的化学和电化学表征

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摘要

In this study, innovative TiO_2/Al_2O_3 mono/ multilayers were applied by atomic layer depositions (ALD) on ASTM-AZ-31 magnesium/aluminum alloy to enhance its well-known scarce corrosion resistance. Four different configurations of ALD layers were tested: single TiO_2 layer, single Al_2O_3 layer, Al_2O_3/ TiO_2 bilayer and Al_2O_3/TiO_2/Al_2O_3/TiO_2 multilayer deposited using Al[(CH_3)]_3 (trimethylaluminum, TMA), and TiCl_4 and H_2O precursors. All depositions were performed at 120 to obtain an amorphous-like structure of both oxide layers. The four coatings were then investigated using different techniques, such as scanning electron microscope (SEM), stylus profilom-eter, glow discharge optical emission spectrometry (GDOES) and polarization curves in 0.05-M NaCl solution. The thickness of all the coatings was around 100 nm. The layers compositions were successfully investigated by the GDOES technique, although obtained data seem to be affected by substrate roughness and differences in sputtering rates between ceramic oxides and metallic magnesium alloy. Corrosion resistance showed to be strongly enhanced by the nanometric coatings, giving lower corrosion current densities in 0.05-M NaCl media with respect to the uncoated substrate (from 10~(-4) to 10~(-6) A/cm~2 for the single layers and from 10~(-4) to 10~(-8) A/cm~2 for the bi- and multilayers). All polarization curves on coated samples also showed a passive region, wider for the bi-layer (from -0.58 to -0.43 V with respect to Ag/AgCl) and multilayer (from -0.53 to -0.38 V with respect to Ag/AgCl) structures.
机译：在这项研究中，通过原子层沉积（ALD）在ASTM-AZ-31镁/铝合金上应用创新的TiO_2 / Al_2O_3单层/多层，以提高其众所周知的稀缺耐蚀性。测试了ALD层的四种不同配置：单TiO_2层，单Al_2O_3层，Al_2O_3 / TiO_2双层和使用Al [（CH_3）] _ 3（三甲基铝，TMA）以及TiCl_4和H_2O前体沉积的Al_2O_3 / TiO_2 / Al_2O_3 / TiO_2多层。在120℃进行所有沉积以获得两个氧化物层的非晶状结构。然后使用不同的技术（如扫描电子显微镜（SEM），测针轮廓仪，辉光放电光发射光谱法（GDOES）和在0.05 M NaCl溶液中的极化曲线）对这四个涂层进行研究。所有涂层的厚度为约100nm。尽管获得的数据似乎受基材粗糙度和陶瓷氧化物与金属镁合金之间溅射速率差异的影响，但已通过GDOES技术成功地研究了这些层的组成。纳米涂层显示出显着增强的耐腐蚀性，相对于未涂层的基材，在0.05-M NaCl介质中具有较低的腐蚀电流密度（对于10-（-4）至10-（-6）A / cm〜2单层，双层和多层为10〜（-4）至10〜（-8）A / cm〜2）。镀膜样品上的所有极化曲线还显示了一个无源区域，该区域对于双层电极（相对于Ag / AgCl为-0.58至-0.43 V）和多层（对于Ag / AgCl为-0.53至-0.38 V）而言较宽结构。

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