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Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

机译:外延应变钴铁氧体(001)薄膜中的垂直磁各向异性

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摘要

We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of Co_xFe_(3-x)O_4(001) epitaxial films (x = 0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant K_u are strongly dependent on the reactive gas (O_2) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co_xFe_(-x)O_4 epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface.
机译:我们研究了Co_xFe_(3-x)O_4(001)外延膜(x = 0.5和0.75)的磁化特性和垂直磁各向异性对反应磁控溅射工艺生长条件的依赖性。尽管通过反射高能电子衍射观察到的所有样品的表面结构几乎没有差异,但是饱和磁化强度和单轴磁性各向异性常数K_u都强烈依赖于反应气体(O_2)的流量。另外,对于所有膜,在膜生长的初期都观察到某些死层状区域。我们的结果表明,Co_xFe _(-x)O_4外延膜的磁性能受界面附近氧化态和膜结构的控制。

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  • 来源
    《Journal of Applied Physics》 |2014年第2期|17A719.1-17A719.3|共3页
  • 作者单位

    Institute of Applied Physics, University of Tsukuba, Tsukuba 305-8573, Japan;

    Institute of Applied Physics, University of Tsukuba, Tsukuba 305-8573, Japan;

    Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai 980-8577, Japan;

    Institute of Applied Physics, University of Tsukuba, Tsukuba 305-8573, Japan;

    Institute of Applied Physics, University of Tsukuba, Tsukuba 305-8573, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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