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Formation of metal nanoparticles by short-distance sputter deposition in a reactive ion etching chamber

机译：在反应离子刻蚀室中通过短距离溅射沉积形成金属纳米颗粒

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摘要

A new method is reported to form metal nanoparticles by sputter deposition inside a reactive ion etching chamber with a very short target-substrate distance. The distribution and morphology of nanoparticles are found to be affected by the distance, the ion concentration, and the sputtering time. Densely distributed nanoparticles of various compositions were fabricated on the substrates that were kept at a distance of 130 μm or smaller from the target. When the distance was increased to 510 μm, island structures were formed, indicating the tendency to form continuous thin film with longer distance. The observed trend for nanoparticle formation is opposite to the previously reported mechanism for the formation of nanoparticles by sputtering. A new mechanism based on the seeding effect of the substrate is proposed to interpret the experimental results.
机译：据报道，一种新方法通过在反应离子刻蚀室内以极短的靶-基片距离溅射沉积来形成金属纳米颗粒。发现纳米粒子的分布和形态受距离，离子浓度和溅射时间的影响。在与靶材保持130μm或更小的距离的基底上制造各种成分的密集分布的纳米颗粒。当距离增加到510μm时，形成岛状结构，表明倾向于形成具有更长距离的连续薄膜。观察到的纳米颗粒形成趋势与先前报道的通过溅射形成纳米颗粒的机理相反。提出了一种基于基体种子效应的新机理来解释实验结果。

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  • 来源
    《Journal of Applied Physics》 |2009年第5期|054314.1-054314.5|共5页
  • 作者

    Min Nie; Kai Sun; Dennis Desheng Meng;

  • 作者单位

    Department of Mechanical Engineering and Engineering Mechanics, Michigan Technological University, Houghton, Michigan 49931, USA;

    Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109, USA;

    Department of Mechanical Engineering and Engineering Mechanics, Michigan Technological University, Houghton, Michigan 49931, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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