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Asymmetric transient enhanced intermixing in Pt/Ti

机译：Pt / Ti中的不对称瞬态增强混合

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摘要

The ion-sputtering induced intermixing is studied by Monte Carlo transport of ions in matter (TRIM), molecular-dynamics (MD) simulations, and Auger electron spectroscopy depth profiling (AES-DP) analysis in Pt/Ti/Si substrate (Pt/Ti) and Ta/Ti/Pt/Si substrate (Ti/Pt) multilayers. Experimental evidence is found for the asymmetry of intermixing in Pt/Ti, and in Ti/Pt. In Ti/Pt we obtain a much weaker interdiffusion (broadening at the interface) than in Pt/Ti. The unexpected enhancement of the interdiffusion of the Pt atoms into the Ti substrate has also been demonstrated by simulations. We are able to capture the essential features of intermixing using TRIM and MD simulations for ion-beam sputtering and find reasonable values for interface broadening which can be compared with the experimental measurements. We explain the asymmetry of IM by the possible occurrence of transient enhanced diffusion in Pt/Ti which manifests in the exponential high diffusity tail of the AES concentration profile.
机译：通过物质中的离子的蒙特卡洛输运（TRIM），分子动力学（MD）模拟和Pt / Ti / Si衬底（Pt /）中的俄歇电子能谱深度分布分析（AES-DP）分析研究了离子溅射诱导的混合Ti）和Ta / Ti / Pt / Si基板（Ti / Pt）多层。发现了有关Pt / Ti和Ti / Pt混合不对称性的实验证据。在Ti / Pt中，我们获得的扩散比在Pt / Ti中弱得多（在界面处扩展）。通过模拟也已经证明了Pt原子向Ti基体相互扩散的出乎意料的增强。我们能够使用TRIM和MD模拟进行离子束溅射捕获混合的基本特征，并找到合理的界面扩展值，可以与实验测量值进行比较。我们通过可能出现的Pt / Ti瞬态增强扩散来解释IM的不对称性，该现象表现为AES浓度曲线的指数高扩散尾巴。

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