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首页> 外文期刊>Journal of Applied Physics >Lattice site location and annealing behavior of implanted Ca and Sr in GaN
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Lattice site location and annealing behavior of implanted Ca and Sr in GaN

机译:GaN中注入的Ca和Sr的晶格位置和退火行为

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We report on the lattice location of ion-implanted Ca and Sr in thin films of single-crystalline wurtzite GaN. Using the emission channeling technique the angular distributions of β~- particles emitted by the radioactive isotopes ~(45)Ca (t_(1/2)=163.8 d) and ~(89)Sr (t_(1/2)=50.53 d) were monitored with a position-sensitive detector following 60 keV room-temperature implantation. Our experiments give direct evidence that ~90% of Ca and > 60% of Sr atoms were occupying substitutional Ga sites with root mean square displacements of the order of 0.15-0.30 A, i.e., larger than the expected thermal vibration amplitude of 0.074 A. Annealing the Ca implanted samples at 1100-1350℃ in high-pressure N_2 atmosphere resulted in a better incorporation into the substitutional Ga site. The Sr implanted sample showed a small decrease in rms displacements for vacuum annealing up to 900℃, while the substitutional fraction remained nearly constant. The annealing behavior of the rms displacements can explain why annealing temperatures above 1100℃ are needed to achieve electrical and optical activations, despite the fact that the majority of the acceptors are already located on Ga sites immediately after ion implantation.
机译:我们报告了离子注入的Ca和Sr在单晶纤锌矿GaN薄膜中的晶格位置。使用发射通道技术,放射性同位素〜(45)Ca(t_(1/2)= 163.8 d)和〜(89)Sr(t_(1/2)= 50.53 d在室温下60 keV植入后,使用位置敏感检测器监控)。我们的实验提供了直接的证据,表明约90%的Ca和> 60%的Sr原子占据了取代的Ga位,其均方根位移为0.15-0.30 A的量级,即大于预期的0.074 A的热振动幅度。在1100〜1350℃的高压N_2气氛中对Ca注入的样品进行退火处理,可以更好地掺入Ga置换位点。植入Sr的样品在900℃以下的真空退火条件下,均方根值的减小很小,而置换分数几乎保持不变。均方根位移的退火行为可以解释为什么为什么需要1100℃以上的退火温度才能实现电激活和光激活,尽管事实上大多数受体在离子注入后已经位于Ga位置。

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