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机译:提取石墨烯的内在场效应迁移率考虑栅极偏压诱导的接触调制的影响
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
School of Electronics Engineering Kyungpook National University Daegu 41566 South Korea;
机译:基于Graphene场效应晶体管的新拟分析模型的内在载流子迁移率
机译:聚(3-烷基噻吩)薄膜场效应晶体管的接触效应和内在参数的提取
机译:高迁移率WSe2 p型和n型场效应晶体管与高掺杂石墨烯接触以实现低电阻接触
机译:金属/石墨烯接触作为性能的杀手超高迁移率石墨烯分析固有迁移率和接触电阻
机译:选择性接触双沟道高电子迁移率场效应晶体管的制作与分析
机译:顶部栅极石墨烯场效应晶体管中金属石墨烯触点的栅极控制肖特基势垒降低的物理模型
机译:高迁移率Wse2 p型和n型场效应晶体管,由高掺杂石墨烯接触,用于低电阻触点