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Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor

机译:Fe植入的4H-SiC半导体磁性的起源

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摘要

p-doped 4H-SiC substrates were implanted with ~(57)Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using ~(57)Fe Conversion Electron Moessbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a ~(57)Fe atoms concentration close to 2% is not only due to the formation of some Fe-Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined.
机译:将P掺杂的4H-SiC衬底植入〜(57)的电荷离子,其能量范围为30-160keV,并进行快速热退火,以在半导体SiC中产生100nm厚区域内的均匀Fe浓度材料。使用〜(57)Fe转换电子Moessbauer光谱法和超导量子干涉装置磁力测量,旨在证明在植入的SiC中获得的铁磁性接近2%的〜2%不仅是由于某些Fe的形成-SI磁性纳米颗粒,但也来自半导体基质中稀释的磁性Fe原子。因此,已经确定了在基质中稀释的纳米颗粒和稀释与纳米颗粒相关的居里温度和与基质相关的纳米颗粒和Fe原子的Fe原子磁化的值。

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  • 来源
    《Journal of Applied Physics》 |2020年第18期|183901.1-183901.6|共6页
  • 作者单位

    Normandie University UNIROUEN INSA Rouen CNRS GPM 76000 Rouen France;

    Normandie University UNIROUEN INSA Rouen CNRS GPM 76000 Rouen France;

    Normandie University UNIROUEN INSA Rouen CNRS GPM 76000 Rouen France Departement de GEM Universite de Cergy-Pontoise rue d'Eragny Neuville sur Oise 95031 Cergy-Pontoise France;

    Normandie University UNIROUEN INSA Rouen CNRS GPM 76000 Rouen France;

    Service de Physique de l'Etat Condense (DSM/IRAMIS/SPEC) UMR 3680 CNRS Bat. 772 Orme des Merisiers CEA Saclay 91191 Gif sur Yvette France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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