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Effect of argon and oxygen gas concentration on mode transition and negative ion production in helicon discharge

机译：氩气和氧气浓度对Helicon放电模式过渡和负离子产生的影响

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摘要

In this paper, the effect of mixing of argon and oxygen gas on the mode transition and negative ion production in the helicon discharge is investigated. In the source chamber of the experimental setup, argon-oxygen gas mixture plasma is produced by applying RF power from 100 W to 2000 W at an applied magnetic field of 0.03 T. In this experiment, the total flow rate is kept at 200 SCCM, corresponding to the working pressure of 4-5 × 10~(-1) Pa. The mode transition to helicon discharge is investigated by varying the concentration of these two gases. To the best of our knowledge, the literature survey indicates this to be the first study of the influence of the mixing of oxygen-argon gas on the mode transition from the inductive to the helicon mode. It is observed that an increase in the concentration of oxygen gas in the discharge shifts mode transition toward higher RF power values, indicating the influence of the nature of the working gas on the transition to the inductive as well as to the helicon mode. The variation of the electron density and temperature is explained in terms of particle and power balance equation. In the source and in the downstream expansion chamber, the effect of the concentration of argon gas on the negative ion production in oxygen discharge is also studied, and the results are explained in terms of various reactions involved in the production and loss of negative ions.
机译：本文研究了氩气混合氩气和氧气对蠕变放电中的升降和负离子产生的影响。在实验装置的源腔中，通过在0.03T的施加磁场下在0.03T的施加磁场下将RF功率从100W至2000W施加RF功率来制备氩气 - 氧气混合物等离子体。在该实验中，总流速保持在200ccm，对应于4-5×10〜（-1）PA的工作压力。通过改变这两个气体的浓度来研究模式过渡到Helicon放电。据我们所知，文献调查表明，这是第一次研究氧气气体混合对从电感到蠕变模式的模式转变的影响。观察到，放电移位模式转变为更高的RF功率值的氧气浓度的增加，表明工作气体对电感以及Helicon模式的影响的影响。以粒子和功率平衡方程来说解释了电子密度和温度的变化。在源和下游膨胀室中，还研究了氩气浓度对氧气排放中的负离子产生的影响，并就涉及生产和丧失负离子的各种反应来解释结果。

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  • 来源
    《Journal of Applied Physics》 |2020年第18期|183303.1-183303.10|共10页
  • 作者

    N. Sharma; M. Chakraborty; P. K. Saha; A. Mukherjee; N. K. Neog; M. Bandyopadhyay;

  • 作者单位

    Centre of Plasma Physics-Institute for Plasma Research Tepesia Sonapur Kamrup Assam 782402 India;

    Centre of Plasma Physics-Institute for Plasma Research Tepesia Sonapur Kamrup Assam 782402 India;

    Centre of Plasma Physics-Institute for Plasma Research Tepesia Sonapur Kamrup Assam 782402 India;

    Centre of Plasma Physics-Institute for Plasma Research Tepesia Sonapur Kamrup Assam 782402 India;

    Centre of Plasma Physics-Institute for Plasma Research Tepesia Sonapur Kamrup Assam 782402 India;

    Institute for Plasma Research HBNI Bhat Gandhinagar 382428 Gujarat India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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