Angular Dependence of the Critical Field of Quenched Thin Pb and Sn Films

Schiller Charles K.; Bulow H.

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Angular Dependence of the Critical Field of Quenched Thin Pb and Sn Films

机译：淬火的铅和锡薄膜的临界场的角依赖性

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Resistive critical field measurements have been performed in quenched pure Pb and Sn films of 1900‐and 650‐Å thicknesses with randomly oriented crystals both following the condensation on a quartz plate at 6.2° and 4.1°K and during annealing. In particular, the dependence of the critical field of these quenched metal films on the angle between the magnetic field direction and the film surface have been investigated. The experiments show that the theory of the behavior of the critical field of thin metal films as presented by Tinkham, based on the concept of flux quantization and vortices, provides a very good description for our quenched metal films. The good agreement between experimental results and theoretical predictions for several annealing temperatures suggests, in addition, that nominal crystal size and defect concentration do not greatly affect the angular dependence of the critical field.

机译：在6.2°和4.1°K的石英板上凝结之后以及在退火过程中，已经对1900和650Å厚的淬火纯Pb和Sn膜进行了电阻临界场测量，这些膜具有随机取向的晶体。特别地，已经研究了这些淬火的金属膜的临界场对磁场方向与膜表面之间的角度的依赖性。实验表明，Tinkham提出的金属薄膜临界场行为的理论基于通量量化和涡旋的概念，为我们的淬火金属膜提供了很好的描述。此外，在几个退火温度下，实验结果与理论预测之间的良好一致性表明，标称晶体尺寸和缺陷浓度不会严重影响临界场的角度依赖性。

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《Journal of Applied Physics》 |1969年第10期|共5页
作者
Schiller Charles K.; Bulow H.;
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Department of Physics, Wayne State University, Detroit, Michigan 48202;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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正文语种 eng
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机译：淬硬的薄铅，锡和铟的临界场的行为：其角度依赖性及其与缺陷浓度，结晶和平均自由程变化的关系。
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8. Enhancement and Angular Dependence of Transport Critical Current Density in Pulsed Laser Deposited YBa2Cu3O7-x+BaSnO3 Films in Applied Magnetic Fields (Postprint). [R] . C. V. Varanasi H. Wang J. Burke L. Brunke M. Sumption 2007

机译：应用磁场中脉冲激光沉积YBa2Cu3O7-x + BasnO3薄膜中传输临界电流密度的增强和角度依赖性（后印刷）。

Angular Dependence of the Critical Field of Quenched Thin Pb and Sn Films

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