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首页> 外文期刊>Journal of Crystal Growth >Formation of InAs quantum dots on low-temperautrue GaAs epi-layer
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Formation of InAs quantum dots on low-temperautrue GaAs epi-layer

机译:在低温GaAs外延层上形成InAs量子点

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摘要

InAs self-organized quantum dots (QDs) grown on annealed low-temperature GaAs (LT-GaAs) epi-layers andon normal temperature GaAs buffer layers have been compared by transmission electron microscopy (TEM) and photo-luminescence (PL) measurements. TEM evidences that self-organizwed QDs were formed with a smaller size and larger density than that on normal GaAs buffer layers. It is discussed QDs were formed with a smaller size and larger density than that on normal GaAs buffer layers. It is discussed that local tensile surface strain regions that are preferrred sites for InAs islands nucleation are increased in the case of the LT-GaAs buffer layers due to exhibiting As precipitates.
机译:已通过透射电子显微镜(TEM)和光致发光(PL)测量比较了在退火的低温GaAs(LT-GaAs)外延层和常温GaAs缓冲层上生长的InAs自组织量子点(QD)。 TEM证明,与常规GaAs缓冲层相比,自组织量子点具有较小的尺寸和较大的密度。讨论了以比普通GaAs缓冲层小的尺寸和更大的密度形成的量子点。讨论了在LT-GaAs缓冲层的情况下由于表现出As沉淀而增加了InAs岛成核的优选部位的局部拉伸表面应变区域。

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