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首页> 外文期刊>Journal of Crystal Growth >Self-assembled GaAs local artificial substrates on Si by droplet epitaxy
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Self-assembled GaAs local artificial substrates on Si by droplet epitaxy

机译:通过液滴外延在硅上自组装GaAs局部人工衬底

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摘要

The fabrication of submicrometer GaAs islands directly on Si substrates by droplet epitaxy is presented. Islands parameters, like density and size, are fully controlled through growth temperature and Ga coverage. The process is fully scalable and at low thermal budget, making these islands good candidates for local artificial substrates with lattice parameters, band alignment and crystalline quality as now required for the implementation of high quality III-As devices on Si.
机译:提出了通过液滴外延直接在Si衬底上制造亚微米GaAs岛的方法。诸如密度和大小之类的离岛参数可通过生长温度和Ga覆盖率完全控制。该工艺是完全可扩展的,且热预算低,这些岛成为具有晶格参数,能带排列和晶体质量的本地人造基板的理想候选者,而这正是在Si上实施高质量III-As器件所必需的。

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